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Reflective Schmidt-Cassegrain system for large-aperture telescopes.
Brychikhin MN, Chkhalo NI, Eikhorn YO, Malyshev IV, Pestov AE, Plastinin YA, Polkovnikov VN, Rizvanov AA, Salashchenko NN, Strulya IL, Toropov MN. Brychikhin MN, et al. Among authors: polkovnikov vn. Appl Opt. 2016 Jun 1;55(16):4430-5. doi: 10.1364/AO.55.004430. Appl Opt. 2016. PMID: 27411199
High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Polkovnikov VN, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Svechnikov MV, Tatarsky DA. Chkhalo NI, et al. Among authors: polkovnikov vn. Opt Lett. 2017 Dec 15;42(24):5070-5073. doi: 10.1364/OL.42.005070. Opt Lett. 2017. PMID: 29240139
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV, Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Pestov AE, Polkovnikov VN, Tatarskiy DA, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Vainer YA, Zorina MV. Svechnikov MV, et al. Among authors: polkovnikov vn. Opt Express. 2018 Dec 24;26(26):33718-33731. doi: 10.1364/OE.26.033718. Opt Express. 2018. PMID: 30650805 Free article.
24 results