Material patterning through templates has provided an efficient way to meet the critical requirement for surface function in various fields. Here, we develop a self-releasing photolithographic process to make large-area freestanding templates with precise patterns. The low surface energy of substrates by hydrophobic treatment with proper silane modification ensures the template self-releasing. This method eliminates the need of mechanical separation or any sacrificial layers. Major steps including UV exposure and baking are optimized to realize high-quality structures and the final release of templates. The negative photoresists of SU-8 and polyimide are chosen to confirm the feasibility of this process. Wafer-scale freestanding templates with uniform microhole arrays are obtained with high structural fidelity, smooth surfaces and excellent flexibility. The hole size ranges from several to several tens of micrometers with an extremely low variation (<1%). These advantages could promote the application of precisely structured templates for surface patterning in material and surface science.
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