Multiphase Reset Induced Reliable Dual-Mode Resistance Switching of the Ta/HfO2/RuO2 Memristor

ACS Appl Mater Interfaces. 2024 Apr 3;16(13):16462-16473. doi: 10.1021/acsami.3c19523. Epub 2024 Mar 21.

Abstract

Higher functionality should be achieved within the device-level switching characteristics to secure the operational possibility of mixed-signal data processing within a memristive crossbar array. This work investigated electroforming-free Ta/HfO2/RuO2 resistive switching devices for digital- and analog-type applications through various structural and electrical analyses. The multiphase reset behavior, induced by the conducting filament modulation and oxygen vacancy generation (annihilation) in the HfO2 layer by interacting with the Ta (RuO2) electrode, was utilized for the switching mode change. Therefore, a single device can manifest stable binary switching between low and high resistance states for the digital mode and the precise 8-bit conductance modulation (256 resistance values) via an optimized pulse application for the analog mode. An in-depth analysis of the operation in different modes and comparing memristors with different electrode structures validate the proposed mechanism. The Ta/HfO2/RuO2 resistive switching device is feasible for a mixed-signal processable memristive array.

Keywords: conduction analysis; device reliability; dual-mode memristor; memristive crossbar array; resistive switching mechanism.