We introduce an innovative method that facilitates precise control of high-quality molybdenum disulfide (MoS2) growth, extending up to three layers, on a large scale. This scalable growth is realized by employing solution-based catalysts and precursors in conjunction with chemical vapor deposition (CVD). The catalyst not only diminishes the precursor's activation energy and melting temperature but also augments the overall reaction rate. By regulating the concentration ratio, we directly manipulate the precursor concentrations, thereby promoting clean growth. This unique control mechanism, as delineated in this study, is unprecedented. Our findings confirm that the catalyst introduction does not compromise the quality of the resulting samples. Field effect transistors (FETs) fabricated from the synthesized MoS2 display superior electrical properties; they exhibit a high carrier mobility of 32.1 cm2 V-1 s-1 and an on/off current ratio of 108, signifying their promising electrical performance. Accordingly, our findings suggest that the solution-based CVD strategy presented herein can be potentially utilized for the integration of FETs into a multitude of practical applications.