Correction: Integrated 4-terminal single-contact nanoelectromechanical relays implemented in a silicon-on-insulator foundry process

Yingying Li; Elliott Worsey; Simon J Bleiker; Pierre Edinger; Mukesh Kumar Kulsreshath; Qi Tang; Alain Yuji Takabayashi; Niels Quack; Peter Verheyen; Wim Bogaerts; Kristinn B Gylfason; Dinesh Pamunuwa; Frank Niklaus

doi:10.1039/d3nr90214e

Correction: Integrated 4-terminal single-contact nanoelectromechanical relays implemented in a silicon-on-insulator foundry process

Nanoscale. 2023 Nov 30;15(46):18940. doi: 10.1039/d3nr90214e.

Affiliations

¹ KTH Royal Institute of Technology, 11428 Stockholm, Sweden. frank@kth.se.
² University of Bristol, BS8 1UB Bristol, UK. Dinesh.Pamunuwa@bristol.ac.uk.
³ École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland.
⁴ IMEC, 3001 Leuven, Belgium.
⁵ Ghent University, 9052 Gent, Belgium.

PMID: 37965952
DOI: 10.1039/d3nr90214e

Abstract

Correction for 'Integrated 4-terminal single-contact nanoelectromechanical relays implemented in a silicon-on-insulator foundry process' by Yingying Li et al., Nanoscale, 2023, https://doi.org/10.1039/d3nr03429a.

Publication types

Published Erratum