The possibility of chemical modification of a graphene oxide film deposited on a Si/SiO2 substrate during a one-stage hydrothermal process in the presence of fluorine ions and reducing agents, such as ascorbic acid or hydrazine, is shown. The proposed technique makes it possible to obtain reduced fluorinated graphene nitride oxide (RGOFN) in the form of a thin film with a controlled composition of functional groups by changing the type and concentration of the reducing agent and then transferring the obtained films to any substrate. XPS and IR spectroscopy of the obtained films revealed controlled changes in the structure and composition of graphene oxide associated with the removal of oxygen groups and the incorporation of fluorine ions as well as the reduction of conjugated double bonds and the controlled incorporation of nitrogen into thin RGOFN films. The current-voltage characteristics of the fabricated RGOFN structures showed that their electrical properties are well controlled by doping with nitrogen during the proposed one-stage process.
Keywords: electrical properties; fluorination; graphene oxide; nitrogen doping; reduction; thin film growth.