LiB3O5 (LBO) crystal has a very high bulk laser damage threshold. Laser damage often occurs on the surfaces with a large number of processing defects during application. In this paper, the surface laser damage threshold, damage growth threshold, and damage growth curve of LBO crystal and fused silica under the same processing process have been comparatively studied by using a 355 nm pulsed laser. The surface laser damage performance of LBO crystal has been comprehensive evaluated. The results show that the laser damage threshold and damage growth threshold of LBO are about twice that of fused silica, and the damage growth coefficient is about 0.7 times that of fused silica. The detection and analysis of impurity defects and photothermal weak absorption defects show that the subsurface defects of LBO crystal are less than that of fused silica. Laser damage morphologies show that the damage process is related to strongly bonded chemical structure and anisotropic physical characteristics of LBO crystal. These characteristics together determine the high threshold damage performance of LBO crystal. The results of this study are of great guidance for the application of LBO crystal in high-power laser systems.