Structural Motifs in Aryl Organogermanium Ge-O Derivatives for Material Design

Kirill V Zaitsev; Igor S Makarov; Yuri F Oprunenko; Victor A Tafeenko; Elmira Kh Lermontova; Andrei V Churakov

doi:10.3390/ijms241713575

Structural Motifs in Aryl Organogermanium Ge-O Derivatives for Material Design

Int J Mol Sci. 2023 Sep 1;24(17):13575. doi: 10.3390/ijms241713575.

Authors

Kirill V Zaitsev¹, Igor S Makarov², Yuri F Oprunenko¹, Victor A Tafeenko¹, Elmira Kh Lermontova³, Andrei V Churakov³

Affiliations

¹ Chemistry Department, M.V. Lomonosov Moscow State University, Leninskye Gory 1, 3, Moscow 119991, Russia.
² A.V. Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, Leninsky Pr. 29, Moscow 119991, Russia.
³ N.S. Kurnakov General and Inorganic Chemistry Institute, Russian Academy of Sciences, Leninskii Pr. 31, Moscow 119991, Russia.

Abstract

The aim of this work was to understand the main structural features and ways of formation of Ge-O bonds in organogermanium compounds under the conditions of Ar_nGeHal_4-n (Hal = halide) hydrolysis. The structural types of these compounds were considered, providing 11 blocks (A-K). The molecular structures of the novel compounds [(p-FC₆H₄)₃Ge]₂O (1), [(p-F₃CC₆H₄)₃Ge]₂O (2), and cyclo-[(p-F₃CC₆H₄)₂GeO]₄ (3) were studied through XRD (X-ray diffraction) analysis. The molecular structure of [(p-F₃CC₆H₄)₃GeO]₄Ge (4), representing a novel structural type, was also investigated. The data presented in this study will be important in the design of materials with useful properties based on group 14 element derivatives with element-oxygen bonding.

Keywords: XRD analysis; germoxane; group 14 elements; organogermanium compounds; organometallic materials.

MeSH terms

Crystallography, X-Ray
Hydrolysis
Oxygen*

Substances

Oxygen

Grants and funding

MK-1790.2014.3/grant from the President of the Russian Federation for the Support of Young Scientists