Editorial for the Special Issue on Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication

Micromachines (Basel). 2023 Aug 18;14(8):1630. doi: 10.3390/mi14081630.

Authors

Lucia Romano^{1

2}, Konstantins Jefimovs²

Affiliations

¹ Institute for Biomedical Engineering, University and ETH Zürich, 8092 Zürich, Switzerland.
² Paul Scherrer Institute, 5232 Villigen, Switzerland.

Abstract

Reactive ion etching (RIE) is the dominating technology for micromachining semiconductors with a high aspect ratio (HAR) [...].

Publication types

Editorial