As society becomes smarter, advanced optical sensing and imaging technologies utilizing visible and near-infrared regions have become increasingly prevalent. Wire-grid polarizers, which are available for broadband electromagnetic waves, are effective in improving the signal-to-noise ratio of such optical systems and enabling more advanced object detection and analysis. However, to be implemented in everyday products, low-cost manufacturing methods must be developed while maintaining high-performance optical functions. To meet these requirements, we conducted an analysis of the geometry of wire-grid polarizers, and designed and developed a wire-grid polarizer with a nano-triangular wave-shaped structure that can be fabricated using general-purpose manufacturing equipment. Once the mould is prepared, this polarizer can be fabricated via nanoimprinting and metal deposition with a normal angle or electroless plating processes. The polarizer fabricated through electroless Ni plating achieves a transmittance of 40%, which is approximately 1.4 times higher than that achieved in a previous study using electroless Ni plating on a rectangular structure with the same period. In addition, the polarizer fabricated through normal angle Al deposition operates over a wide range of wavelengths from visible light to near-infrared, and achieves a polarization extinction ratio of 24 dB at a wavelength of 550 nm and a high transmittance of 81%. High-performance polarizers can be obtained through normal-angle deposition using general-purpose equipment in contrast to the oblique-angle deposition method employed in the manufacture of conventional rectangular structure-based wire-grid polarizers, thereby contributing to cost reduction and improved manufacturability.
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