Transferable nano-patterned ALD membrane

Farhana Anwar; Matthew Tao; Adam Schwartzberg; Frank Ogletree; Maria Virginia Altoe; Archana Raja; Stefano Cabrini

doi:10.1088/1361-6528/acd45b

Transferable nano-patterned ALD membrane

Nanotechnology. 2023 Jun 6;34(34). doi: 10.1088/1361-6528/acd45b.

Authors

Farhana Anwar¹, Matthew Tao², Adam Schwartzberg¹, Frank Ogletree¹, Maria Virginia Altoe¹, Archana Raja¹, Stefano Cabrini¹

Affiliations

¹ Molecuar Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720, United States of America.
² Department of Physics, University of California Berkeley, 1 Cal Berkeley Spc 9, Berkeley, CA 94720, United States of America.

PMID: 37167958
DOI: 10.1088/1361-6528/acd45b

Abstract

We demonstrate fabrication of nano-patterned thin ALD (Atomic layer deposition) membrane (suspended/transferable) by using a bi-layer resist process where the bottom layer resist acts as a sacrificial layer. This method enables an all dry deterministic transfer of nano-patterned ALD membrane on desired substrate, allowing assembly of multitude of hetero-structures and functionalities that are not yet accessible. Unlike conventional ways of achieving patterned alumina membrane reported in literature our technique requires significantly less fabrication steps and paves the way for novel ALD membrane-based technology.

Keywords: ALD; dry transfer; membrane; multi-layer resist; nano-patterning; transferable.