Applications of remote epitaxy and van der Waals epitaxy

Ilpyo Roh; Seok Hyeon Goh; Yuan Meng; Justin S Kim; Sangmoon Han; Zhihao Xu; Han Eol Lee; Yeongin Kim; Sang-Hoon Bae

doi:10.1186/s40580-023-00369-3

Applications of remote epitaxy and van der Waals epitaxy

Nano Converg. 2023 Apr 30;10(1):20. doi: 10.1186/s40580-023-00369-3.

Authors

Ilpyo Roh^#^{1

2}, Seok Hyeon Goh^#³, Yuan Meng¹, Justin S Kim⁴, Sangmoon Han¹, Zhihao Xu⁴, Han Eol Lee⁵, Yeongin Kim⁶, Sang-Hoon Bae^{7

8}

Affiliations

¹ Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
² R&D CENTER, M.O.P Co., Ltd, Seoul, 07281, South Korea.
³ Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea.
⁴ The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
⁵ Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea. haneol@jbnu.ac.kr.
⁶ Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, OH, 45221, USA. kim4yg@ucmail.uc.edu.
⁷ Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA. sbae22@wustl.edu.
⁸ The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA. sbae22@wustl.edu.

^# Contributed equally.

Abstract

Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration.

Keywords: 2DLT; Freestanding membrane; Heterogeneous integration; Remote epitaxy; Van der Waals epitaxy.

Publication types

Review

Abstract

Publication types

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