Membrane-based separation processes are part of most water purification plants worldwide. Industrial separation applications, primarily water purification and gas separation, can be improved with novel membranes or modification to existing ones. Atomic layer deposition (ALD) is an emerging technique that is proposed to upgrade certain kinds of membranes independent of their chemistry and morphology. ALD deposits thin, defect-free, angstrom-scale, and uniform coating layers on a substrate's surface by reacting with gaseous precursors. The surface-modifying effects of ALD are described in the present review, followed by a description of various types of inorganic and organic barrier films and how these can be used in combination with ALD. The role of ALD in membrane fabrication and modification is categorized into different membrane-based groups according to the treated medium, i.e., water or gas. In all membrane types, the ALD-based direct deposition of inorganic materials, mainly metal oxides, on the membrane surface can improve antifouling, selectivity, permeability, and hydrophilicity. Therefore, the ALD technique can broaden the applications of membranes to the treatment of emerging contaminants in water and air. Finally, the advancement, limitations, and challenges of ALD-based membrane fabrication and modification are compared to provide a comprehensive guideline for developing next-generation membranes with improved filtration and separation performance.
Keywords: atomic layer deposition; gas separation; membrane processes; surface modification; water purification.