Direct focused-ion-beam writing is presented as an enabling technology for realizing functional spin-wave devices of high complexity, and demonstrate its potential by optically-inspired designs. It is shown that ion-beam irradiation changes the characteristics of yttrium iron garnet films on a submicron scale in a highly controlled way, allowing one to engineer the magnonic index of refraction adapted to desired applications. This technique does not physically remove material, and allows rapid fabrication of high-quality architectures of modified magnetization in magnonic media with minimal edge damage (compared to more common removal techniques such as etching or milling). By experimentally showing magnonic versions of a number of optical devices (lenses, gratings, Fourier-domain processors) this technology is envisioned as the gateway to building magnonic computing devices that rival their optical counterparts in their complexity and computational power.
Keywords: focused ion beam in yttrium iron garnet; optomagnonics; spin wave computing.
© 2023 The Authors. Small published by Wiley-VCH GmbH.