Mechanical Properties and Oxidation Behavior of TaWSiN Films

Chin-Han Tzeng; Li-Chun Chang; Yung-I Chen

doi:10.3390/ma15228179

Mechanical Properties and Oxidation Behavior of TaWSiN Films

Materials (Basel). 2022 Nov 17;15(22):8179. doi: 10.3390/ma15228179.

Authors

Chin-Han Tzeng¹, Li-Chun Chang^{2

3}, Yung-I Chen^{1

4}

Affiliations

¹ Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, Keelung City 202301, Taiwan.
² Department of Materials Engineering, Ming Chi University of Technology, New Taipei 243303, Taiwan.
³ Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei 243303, Taiwan.
⁴ Center of Excellence for Ocean Engineering, National Taiwan Ocean University, Keelung City 202301, Taiwan.

Abstract

This study explored the structural characteristics, mechanical properties, and oxidation behavior of W-enriched TaWSiN films prepared through co-sputtering. The atomic ratios [W/(W + Ta)] of the as-deposited films maintained a range of 0.77-0.81. The TaWSiN films with a Si content of 0-13 at.% were crystalline, whereas the film with 20 at.% Si was amorphous. The hardness and Young's modulus of crystalline TaWSiN films maintained high levels of 26.5-29.9 GPa and 286-381 GPa, respectively, whereas the hardness and Young's modulus of the amorphous Ta₇W₃₃Si₂₀N₄₀ films exhibited low levels of 18.2 and 229 GPa, respectively. The oxidation behavior of TaWSiN films was investigated after annealing at 600 °C in a 1%O₂-Ar atmosphere, and cone-like Ta_0.3W_0.7O_2.85 oxides formed and extruded from the TaWSiN films.

Keywords: co-sputtering; hard coatings; mechanical properties; oxidation; residual stress.

Grants and funding

This research was funded by the Ministry of Science and Technology, Taiwan, grant numbers 110-2221-E-019-015 and 110-2221-E-131-013. The APC was funded by National Taiwan Ocean University.