Particulate toxicity of metal-organic framework UiO-66 to white rot fungus Phanerochaete chrysosporium

Ecotoxicol Environ Saf. 2022 Dec 1:247:114275. doi: 10.1016/j.ecoenv.2022.114275. Epub 2022 Nov 7.

Abstract

Metal-organic frameworks (MOF) are emerging materials with fantastic properties and wide applications. The release of metal ions from MOF materials is usually regarded as the origin of soluble MOF toxicity. However, whether the stable MOF particulates would induce environmental hazards is not clear. Herein, we aimed to reveal the particulate toxicity of MOF materials using the insoluble UiO-66 as the representative MOF and Phanerochaete chrysosporium as the model microorganism. UiO-66 nanoparticles (NPs) were synthesized by solvothermal method and their diameter was 68.4 ± 8.5 nm. UiO-66 NPs were stable in the culture system and the dissolution rate of 500 mg/L group was 0.26% after 14 d incubation. UiO-66 NPs did not affect the fungus growth according to the fresh weight increases and unchanged dry weights. Fungus mycelia kept even at concentrations up to 500 mg/L. Ultrastructural observation showed that UiO-66 NPs did not enter the fungal cells, but slightly destroyed the cell wall. UiO-66 NPs inhibited the laccase activity and promoted the activity of manganese peroxidase. The overall impact on the decomposition activity of P. chrysosporium was low in dye coloration test and sawdust degradation assay. Meaningful oxidative stress was aroused by UiO-66 NPs, as indicated by the decreases of catalase, glutathione, and total superoxide dismutase, and the increases of H2O2. Our results collectively suggested that the MOF particulates could induce mild mechanical damage to fungi and the toxicity was low comparing to other instable MOF materials.

Keywords: Decomposition activity; Environmental toxicity; Metal-organic framework; Oxidative stress; Particulates.

MeSH terms

  • Dust
  • Hydrogen Peroxide
  • Metal-Organic Frameworks*
  • Phanerochaete*
  • Phthalic Acids*

Substances

  • Metal-Organic Frameworks
  • UiO-66
  • Hydrogen Peroxide
  • Phthalic Acids
  • Dust