We experimentally demonstrate sub-diffraction imaging in infrared-sensitive third-order sum frequency generation (TSFG) microscope using focal-field engineering technique. The TSFG interaction studied here makes use of two mid infrared photons and a single 1040 nm pump photon to generate up-converted visible photons. Focal field engineering scheme is implemented using a Toraldo-style single annular phase mask imprinted on the 1040 nm beam using a spatial light modulator. The effect of focal field engineered excitation beam on the non-resonant-TSFG process is studied by imaging isolated silicon sub-micron disks and periodic grating structures. Maximum reduction in the measured TSFG central-lobe size by ∼43% with energy in the central lobe of 35% is observed in the presence of phase mask. Maximum contrast improvement of 30% is observed for periodic grating structures. Furthermore, to validate the infrared sensitivity of the focus engineered TSFG microscope, we demonstrate imaging of amorphous Germanium-based guided-mode resonance structures, and polystyrene latex beads probed near the O-H vibrational region. We also demonstrate the utility of the focus engineered TSFG microscope for high resolution imaging of two-dimensional layered material. Focus-engineered TSFG process is a promising imaging modality that combines infrared selectivity with improved resolution and contrast, making it suitable for nanostructure and surface layer imaging.