In this article, we present a systematic investigation on a multistep nanosphere lithography technique to uncover its potential in fabricating a wide range of two- and three-dimensional nanostructures. A tilted (polar angle) electron beam shower on a nanosphere mask results in an angled shadow mask deposition. The shape of the shadow also depends on the azimuthal angle of the mask sitting on top of the substrate. We performed angled shadow mask depositions with systematic variation of these two angular parameters, giving rise to complex nanostructures (down to 50 nm), repeated over a large area without defect. In this article, nanosphere lithography with two- and four-fold azimuthal symmetry was studied at constant tilt angles followed by variations in tilt without azimuthal rotation of the substrate. Finally, both angular parameters were simultaneously varied. The structure of shadow crystals was explained using Matlab simulation. This work stretches the horizons of nanosphere lithography, opening up new scopes in plasmonic and magnonic research.
Keywords: angled shadow mask deposition; angular acceleration; nanopyramid; nanosphere lithography; symmetry breaking.