In this paper, we proposed a double-layer all-dielectric grating. Under the premise of ensuring the strength of the resonance peak, the upper SiO2 grating layer suppresses the tendency of high-order dipole resonance excitation and improves the transmittance at the non-resonant position (T > 99%). The distribution of chromaticity coordinates on the CIE 1931 chromaticity diagram also proves that suppressing side peaks can effectively increase the saturation of structural colors, which is essential for a high precision imaging system. The cyclic displacement current excites the magnetic dipole resonance, which causes the magnetic field to be confined in the high refractive index material HfO2 grating layer. By adjusting the duty cycle of the grating structure, a reflection spectrum with low full width half maximum (FWHM) (∼2 nm) and high-quality factor Q (∼424.5 nm) can be obtained. And the spectral intensity is more sensitive to the polarization angle. This work is of great significance to the development of sensors, display imaging and other fields. At the same time, the material of the grating filter meets the requirements of high damage threshold of the high-power laser system, and its high-power laser application potential is inestimable.