Optical properties of black silicon structures ALD-coated with Al2O3

David Schmelz; Kristin Gerold; Thomas Käsebier; Natali Sergeev; Adriana Szeghalmi; Uwe D Zeitner

doi:10.1088/1361-6528/ac9419

Optical properties of black silicon structures ALD-coated with Al₂O₃

Nanotechnology. 2022 Oct 12;34(1). doi: 10.1088/1361-6528/ac9419.

Authors

David Schmelz¹, Kristin Gerold^{1

2}, Thomas Käsebier¹, Natali Sergeev¹, Adriana Szeghalmi^{1

2}, Uwe D Zeitner^{1

2}

Affiliations

¹ Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Germany.
² Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany.

PMID: 36164977
DOI: 10.1088/1361-6528/ac9419

Abstract

Atomic layer deposited (ALD) Al₂O₃coatings were applied on black silicon (b-Si) structures. The coated nanostructures were investigated regarding their reflective and transmissive behaviour. For a systematic study of the influence of the Al₂O₃coating, ALD coatings with a varying layer thickness were deposited on three b-Si structures with different morphologies. With a scanning electron microscope the morphological evolution of the coating process on the structures was examined. The optical characteristics of the different structures were investigated by spectral transmission and reflection measurements. The usability of the structures for highly efficient absorbers and antireflection (AR) functionalities in the different spectral regions is discussed.

Keywords: Al2O3; antireflective structures; atomic layer deposition; black silicon; light trapping.

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