The layer thickness measurement process is an indispensable companion of vacuum sputtering and evaporation. Thus, quartz crystal microbalance is a well-known and reliable method for monitoring film thickness. However, most commercial devices use very simple signal processing methods, offering only a readout of the frequency change value and an approximate sputtering rate. Here, we show our concept of instrument, to better control the process parameters and for easy replication. The project uses open-source data and its own ideas, fulfilling all the requirements of a measuring system and contributing to the open-source movement due to the added value and the replacement of obsolete technologies with contemporary ones. The device provides an easy way to expand existing sputtering machines with a proper controller based on our work. The device described in the paper can be easily used in need, being a proven project of a fast, inexpensive, and reliable thin-film thickness monitor.
Keywords: FTM; QCM; evaporation; film thickness monitor; sputtering.