The Distance between Minima of Electron Density and Electrostatic Potential as a Measure of Halogen Bond Strength

Edem R Chakalov; Elena Yu Tupikina; Daniil M Ivanov; Ekaterina V Bartashevich; Peter M Tolstoy

doi:10.3390/molecules27154848

The Distance between Minima of Electron Density and Electrostatic Potential as a Measure of Halogen Bond Strength

Molecules. 2022 Jul 28;27(15):4848. doi: 10.3390/molecules27154848.

Authors

Edem R Chakalov¹, Elena Yu Tupikina¹, Daniil M Ivanov¹, Ekaterina V Bartashevich², Peter M Tolstoy¹

Affiliations

¹ Institute of Chemistry, St. Petersburg State University, 198504 St. Petersburg, Russia.
² Chemistry Department, South Ural State University, 454080 Chelyabinsk, Russia.

Abstract

In this study, we present results of a detailed topological analysis of electron density (ED) of 145 halogen-bonded complexes formed by various fluorine-, chlorine-, bromine-, and iodine-containing compounds with trimethylphosphine oxide, Me₃PO. To characterize the halogen bond (XB) strength, we used the complexation enthalpy, the interatomic distance between oxygen and halogen, as well as the typical set of electron density properties at the bond critical points calculated at B3LYP/jorge-ATZP level of theory. We show for the first time that it is possible to predict the XB strength based on the distance between the minima of ED and molecular electrostatic potential (ESP) along the XB path. The gap between ED and ESP minima exponentially depends on local electronic kinetic energy density at the bond critical point and tends to be a common limiting value for the strongest halogen bond.

Keywords: 31P NMR; QTAIM; bond strength; density functional theory; electron density; electrostatic potential; halogen bond; interaction energy; phosphine oxide.

Grants and funding

18-13-00050/Russian Science Foundation