Ceramic thin films with variable thicknesses have been used in many applications. In order to protect the petroleum transportation pipes against the harmful H2S action, two ceramic materials as thin layers are proposed. In this article, pulsed laser deposition (PLD) of ceramic layers by in situ time-resolved optical techniques is investigated. Two ceramic materials were used as targets and real-time monitoring of the PLD process was realized via ICCD fast camera imaging and optical emission spectroscopy. The space-time displacement of the ceramic emissions was analyzed in order to determine the plasma structure and respective kinetic energies. Spectral-resolved investigation allowed the determination of plasma species individual velocities (in the first case: 43 km/s for C ionic species, 11 km/s for Si, from 25 to 5 km/s for atomic species; in the second case: 32 km/s for C ionic species, 11 km/s for W species, and 15 and 53 km/s for neutral species). SEM and AFM techniques were implemented to analyze the resulting ceramic layers showing homogeneous surfaces with characteristic material droplets. The ablation crater also reveals selective ablation during the deposition process. EDX results show that Al/Si is retained in the thin films similar to the target composition.
Keywords: ICCD imaging; ceramic thin film; electron temperature; optical emission spectroscopy; plasma structuring; pulsed laser deposition.