Solution-processed inorganic nanoporous films are key components for the vast spectrum of applications ranging from dew harvesting to solar cells. Shaping them into complex architectures required for advanced functionality often needs time-consuming or expensive fabrication. In this work, crack formation is harnessed to pattern porous inorganic films in a single step and without using lithography. Aqueous inks, containing inorganic precursors and polymeric latexes enable evaporation-induced, defect-free periodic arrays of cracks with tunable dimensions over several centimeters. The ink formulation strategy is generalized to more than ten inorganic materials including simple and binary porous oxide and metallic films covering a whole spectrum of properties including insulating, photocatalytic, electrocatalytic, conductive, or electrochromic materials. Notably, this approach enables 3D self-assembly of cracks by stacking several layers of different compositions, yielding periodic assemblies of polygonal shapes and Janus-type patterns. The crack patterned periodic arrays of nanoporous TiO2 diffract light, and are used as temperature-responsive diffraction grating sensors. More broadly, this method represents a unique example of a self-assembly process leading to long-range order (over several centimeters) in a robust and controlled way.
Keywords: cracks; inorganic materials; patterning; photonics; porous films.
© 2022 The Authors. Advanced Materials published by Wiley-VCH GmbH.