Colloidal photolithography is a versatile advanced technique for fabricating periodic nanopatterned arrays, with patterns carved exclusively on photoresist films deposited on solid substrates in a typical photolithographic process. In this study, we apply colloidal photolithography to polystyrene (PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids at the air-water interface and demonstrate that periodic hole structures can be carved in PS films by two processes: photodecomposing PS films with ultraviolet (UV) light and removing PMMA colloids with a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral comma-shaped holes, are also fabricated by regulating the UV illumination conditions. Furthermore, in addition to holes, convex patterns on PS films are realized by combining weak UV illumination with solvent treatment. We also demonstrate that actively using the water surface as the UV illumination field enables periodic silver nanoparticle spots to be deposited on PS films simply by dissolving silver ions in the water phase.