Graphene-driving novel strain relaxation towards AlN film and DUV photoelectronic devices

Light Sci Appl. 2022 May 30;11(1):164. doi: 10.1038/s41377-022-00861-1.

Abstract

Graphene-driving strain-pre-store engineering enables the epitaxy of strain-free AlN film with low dislocation density for DUV-LED and the unique mechanism of strain-relaxation in QvdW epitaxy was demystified.