Transition metal dichalcogenide graded alloy monolayers by chemical vapor deposition and comparison to 2D Ising model

Alireza Jalouli; Muhammed Kilinc; Austin Marga; Mengying Bian; Tim Thomay; Athos Petrou; Hao Zeng

doi:10.1063/5.0081929

Transition metal dichalcogenide graded alloy monolayers by chemical vapor deposition and comparison to 2D Ising model

J Chem Phys. 2022 Apr 7;156(13):134704. doi: 10.1063/5.0081929.

Authors

Alireza Jalouli¹, Muhammed Kilinc¹, Austin Marga¹, Mengying Bian¹, Tim Thomay¹, Athos Petrou¹, Hao Zeng¹

Affiliation

¹ Department of Physics, University at Buffalo, The State University of New York, Buffalo, New York 14260, USA.

PMID: 35395886
DOI: 10.1063/5.0081929

Abstract

In this work, a chemical vapor deposition (CVD) method was developed for the synthesis of transition metal dichalcogenide alloy monolayers, with a composition gradient in the radial direction. The composition gradient was achieved by controlling the substrate cooling rate during the CVD growth. The two types of alloys, namely, WS_2(1-x)Se_2x and MoS_2(1-x)Se_2x, were found to exhibit an opposite composition gradient. This is attributed to their different cohesive energies. A two-dimensional Ising model is used to explain the growth mechanism, where two ends of the composition were modeled as a magnetically ordered phase and a paramagnetic phase. The composition as a function of substrate temperature is then represented by the thermal magnetization curve.