A synchrotron-based kilowatt-level radiation source for EUV lithography

Bocheng Jiang; Chao Feng; Changliang Li; Zhenghe Bai; Weishi Wan; Dao Xiang; Qiang Gu; Kun Wang; Qinglei Zhang; Dazhang Huang; Senyu Chen

doi:10.1038/s41598-022-07323-z

A synchrotron-based kilowatt-level radiation source for EUV lithography

Sci Rep. 2022 Feb 28;12(1):3325. doi: 10.1038/s41598-022-07323-z.

Authors

Bocheng Jiang^{1

2}, Chao Feng^{3

4}, Changliang Li¹, Zhenghe Bai⁵, Weishi Wan⁶, Dao Xiang⁷, Qiang Gu^{1

2}, Kun Wang^{1

2

8}, Qinglei Zhang¹, Dazhang Huang^{1

2}, Senyu Chen⁹

Affiliations

¹ Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.
² Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China.
³ Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China. fengchao@zjlab.org.cn.
⁴ Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China. fengchao@zjlab.org.cn.
⁵ National Synchrotron Radiation Laboratory, USTC, Hefei, 230029, China.
⁶ School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China.
⁷ Key Laboratory for Laser Plasmas (Ministry of Education), School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240, China.
⁸ University of the Chinese Academy of Sciences, Beijing, 100049, China.
⁹ Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China.

Abstract

A compact damping ring with a limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the storage ring is modulated by a 257 nm wavelength seed laser with the help of the angular-dispersion-induced micro-bunching method (Feng and Zhao in Sci Rep 7:4724, 2017), coherent radiation at 13.5 nm with an average power of about 2.5 kW can be achieved with the state-of-the-art accelerator and laser technologies.

Abstract

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