Haloacetic acids (HAAs), as a representative category of halogenated disinfection byproducts, are widely detected in disinfected water. In this work, the vacuum ultraviolet (VUV)/sulfite process under N2 saturated conditions was proposed to eliminate a series of HAAs (i.e., monochloroacetic acid (MCAA), difluoroacetic acid (DFAA), trifluoroacetic acid (TFAA), dichloroacetic acid (DCAA), etc.). The in situ generated hydrated electron (eaq-) demonstrated to be the main species to fulfill the initial degradation and dechlorination of MCAA, while hydroxyl radicals (˙OH) were in charge of the mineralization of MCAA. This means that the VUV/sulfite system is a combination of advanced reduction and oxidation processes (ARPs and AOPs). A significant enhancement of MCAA removal was observed with increasing pH values from 6.0 to 10.0, and surprisingly, kobs correlated well with the proportion of SO32- as the pH changed. This can be explained by the production of eaq- from VUV irradiation of SO32- rather than HSO3- and also due to eaq- being more stable under alkaline conditions. Increasing the sulfite dosage also elevated the degradation of MCAA. However, the addition of certain anions (i.e., chloride (Cl-), bicarbonate (HCO3-), and nitrate (NO3-)) and dissolved organic matter (DOM) inhibited the removal of MCAA to varying degrees. The VUV/sulfite system was effective toward various types of halogenated disinfection byproducts, supporting its broad applicability. Nevertheless, even in real waters, the VUV/sulfite system was also promising for the simultaneous abatement of HAAs and other oxyanions.
Keywords: Hydrated electron; advanced oxidation process; advanced reduction process; monochloroacetic acid; vacuum ultraviolet.
Copyright © 2021. Published by Elsevier Ltd.