Nanopatterning to fabricate advanced nanostructured materials is a widely employed technology in a broad spectrum of applications going from spintronics and nanoelectronics to nanophotonics. This work reports on an easy route for nanopatterning making use of ordered porous templates with geometries ranging from straight lines to square, triangular or rhombohedral lattices, to be employed for the designed growth of sputtered materials with engineered properties. The procedure is based on large-scale nanoimprinting using patterned low-cost commercial disks, as 1-D grating stamps, followed by a single electrochemical process that allows one to obtain 1-D ordered porous anodic templates. Multiple imprinting steps at different angles enable more complex 2-D patterned templates. Subsequently, sputtering facilitates the growth of ferromagnetic antidot thin films (e.g., from 20 to 100 nm Co thick layers) with designed symmetries. This technique constitutes a non-expensive method for massive mold production and pattern generation avoiding standard lithographical techniques. In addition, it overcomes current challenges of the two-stage electrochemical porous anodic alumina templates: (i) allowing the patterning of large areas with high ordering and/or complex antidot geometries, and (ii) being less-time consuming.
Keywords: combined imprint-electrochemical processes; ferromagnetic antidots; large-scale nanopatterning; porous anodic alumina membranes; square and triangular 2D templates.