Meeting the evolving demands of plasmonics research requires increasingly precise control over surface plasmon properties, which necessitates extremely fine nanopatterning, complex geometries, and/or long-range order. Nanoplasmonic metasurfaces are representative of a modern research area requiring intricate, high-fidelity features reproduced over areas of several free-space wavelengths, making them one of the most challenging fabrication problems in the field today. This work presents a systematic study of the helium focused ion beam milling of gold for nanoplasmonic metasurface applications, using as its example a nanoplasmonic metasurface based on an array of nanometer-scale plasmonic-wire-loaded subwavelength apertures in a gold film. At each step, the pattern variations are compared to simulation to predict the experimental outcome. Our results show that even in a practical fabrication environment, helium ion beam milling can be used to reliably pattern 10 nm features into gold with 1:5 aspect ratio in complex geometries over a wide area.
Keywords: focused ion beam; helium ion microscope; metasurface; nanoscale patterning; plasmonics; sputtering.