Prediction of Co and Ru nanocluster morphology on 2D MoS2 from interaction energies

Abstract

Layered materials, such as MoS₂, have a wide range of potential applications due to the properties of a single layer, which often differ from the bulk material. They are of particular interest as ultrathin diffusion barriers in semiconductor device interconnects and as supports for low-dimensional metal catalysts. Understanding the interaction between metals and the MoS₂ monolayer is of great importance when selecting systems for specific applications. In previous studies the focus has been largely on the strength of the interaction between a single atom or a nanoparticle of a range of metals, which has created a significant knowledge gap in understanding thin film nucleation on 2D materials. In this paper, we present a density functional theory (DFT) study of the adsorption of small Co and Ru structures, with up to four atoms, on a monolayer of MoS₂. We explore how the metal-substrate and metal-metal interactions contribute to the stability of metal clusters on MoS₂, and how these interactions change in the presence of a sulfur vacancy, to develop insight to allow for a prediction of thin film morphology. The strength of interaction between the metals and MoS₂ is in the order Co > Ru. The competition between metal-substrate and metal-metal interaction allows us to conclude that 2D structures should be preferred for Co on MoS₂, while Ru prefers 3D structures on MoS₂. However, the presence of a sulfur vacancy decreases the metal-metal interaction, indicating that with controlled surface modification 2D Ru structures could be achieved. Based on this understanding, we propose Co on MoS₂ as a suitable candidate for advanced interconnects, while Ru on MoS₂ is more suited to catalysis applications.

Keywords: 2D materials; cobalt (Co); molybdenum disulfide (MoS2); ruthenium (Ru); thin film nucleation.