We present the first experimental demonstration of a planar focusing monolithic subwavelength grating mirror. The grating is formed on the surface of GaAs and focuses 980 nm light in one dimension on the high-refractive-index side of the mirror. According to our measurements, the focal length is 475 μm (300 μm of which is GaAs) and the numerical aperture is 0.52. The intensity of the light at the focal point is 23 times larger than that of the incident light. To the best of our knowledge, this is the highest value reported for a grating mirror. Moreover, the full width at half-maximum (FWHM) at the focal point is only 3.9 μm, which is the smallest reported value for a grating mirror. All of the measured parameters are close to or very close to the theoretically predicted values. Our realization of a sophisticated design of a focusing monolithic subwavelength grating opens a new avenue to technologically simple fabrication of the gratings for use in diverse optoelectronic materials and applications.
Keywords: GaAs; MHCG; focusing mirrors; high-contrast gratings; metasurfaces.