The d-spacing of the multilayer lamellar grating was theoretically optimized to improve the energy resolution and maintain a high efficiency. Based on the study of the growth behavior of Mo/Si multilayer on the lamellar grating under different sputtering pressures, Ar gas pressure of 1 mTorr was selected, which can fabricate the multilayer with lower roughness and a good replication of the groove shape. An absolute diffraction efficiency of 25.6% and a Cff factor of 1.79 were achieved for the -1st order of the Mo/Si lamellar multilayer grating at an energy of 1700 eV.