Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

Affiliations

• ¹ Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA. ufuk.kilic@huskers.unl.edu.
• ² Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA.
• ³ Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln, NE, USA.
• ⁴ Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA.
• ⁵ Department of Chemical Engineering, Polytechnic University of Puerto Rico, San Juan, PR, USA.
• ⁶ Department of Chemistry, University of Nebraska - Lincoln, Lincoln, NE, 68588, USA.
• ⁷ Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, NE, 68588, USA. schubert@engr.unl.edu.
• ⁸ Institutionen För Fysik, kemi och biologi (IFM), Linköpings Universitet, 58183, Linköping, Sweden. schubert@engr.unl.edu.
• ⁹ Leibniz Institut Für Polymerforschung Dresden E.V., 01005, Dresden, Germany. schubert@engr.unl.edu.