Ge single-junction solar cell structures are grown on micro-patterned Ge substrates using lowpressure metalorganic chemical vapor deposition. 300 nm high micro-rod arrays are formed on the p-Ge substrates using photolithography and dry etching techniques. The micro-rod arrays are designed with rod diameter varying from 5 to 15 μm and arranged in a hexagonal geometry with rod spacing varying from 2 to 12 μm. Ge p-n junction structures are fabricated by phosphorus atomic diffusion process on the micro-patterned Ge substrates. 100 nm thick InGaP window and 300 nm thick GaAs cap layers are grown to reduce the surface recombination and the ohmic contact resistivity, respectively. Our results indicate that the micro-rod structures improve the performance of the Ge solar cells. An improvement of 16.1% in the photocurrent of the Ge micro-rod solar cell is observed compared to that of a reference Ge solar cell with planar surface. The improvement in the short circuit current density can be attributed to the light trapping effect, enlarged p-n junction area, and enhanced carrier collection efficiency. As a result, the conversion efficiency of the Ge solar cell with micro-rod arrays (5 μm diameter, 2 μm spacing, and 300 nm height) is improved from 3.84 to 4.78% under 1 sun AM 1.5G conditions.