Enantioselective recognition of amino acid based on electrochemical deposition and X-ray diffraction technology

Hui Chong; Gaomin Zhang; Yaohang Wu; Bin Xu; Guoxiu Wang; Chengyin Wang

doi:10.1016/j.jinorgbio.2021.111398

Enantioselective recognition of amino acid based on electrochemical deposition and X-ray diffraction technology

J Inorg Biochem. 2021 May:218:111398. doi: 10.1016/j.jinorgbio.2021.111398. Epub 2021 Feb 25.

Authors

Hui Chong¹, Gaomin Zhang¹, Yaohang Wu², Bin Xu³, Guoxiu Wang⁴, Chengyin Wang⁵

Affiliations

¹ College of Chemistry & Chemical Engineering, Yangzhou University, Yangzhou, China.
² College of Materials Science and Engineering, Jilin University, Changchun City, Jilin Province, China.
³ Testing Center of Yangzhou University, City of Yangzhou, Jiangsu Province, China.
⁴ School of Mathematical and Physical Sciences, PO Box 123, Broadway, Sydney, NSW, 2007 Australia. Electronic address: Guoxiu.Wang@uts.edu.an.
⁵ College of Chemistry & Chemical Engineering, Yangzhou University, Yangzhou, China; Testing Center of Yangzhou University, City of Yangzhou, Jiangsu Province, China. Electronic address: wangcy@yzu.edu.cn.

PMID: 33684685
DOI: 10.1016/j.jinorgbio.2021.111398

Abstract

Addition of D-Asp in the electrochemical deposition process of Bismuth film resulted the generation of a new diffraction peak in X-ray diffraction (XRD) spectrum. This phenomenon was not observed in the situation of L-Asp. The new diffraction peak might suggest D-Asp could result in the generation of a specific Bismuth structure. Enantioselective recognition of D- and L-Asp can be realized based on this new XRD peak. The limit of detection was determined to be 3.5 × 10^-8 and 1.7 × 10^-8 mol L^-1 for D- and L-Asp, respectively. The XRD spectra of electrodeposited Copper films fabricated in the presence of D- or L-Asp showed different lattice plane diffraction peak intensity ratios. The reason was believed to be chirality induced different binding capabilities of Asp enantiomers that influenced Copper film growth. Therefore, the combination of electrochemical deposition using Copper as metal source and XRD technology can be used to achieve enantioselective recognition of Asp. The limit of detection for D- and L-Asp were determined to be 1.5 × 10^-10 and 1.2 × 10^-11 mol L^-1, respectively.

Keywords: Amino acid sensing; Electrochemical depositionl; Enantioselective; X-ray.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Aspartic Acid / chemistry*
Biosensing Techniques / instrumentation
Biosensing Techniques / methods*
Bismuth / chemistry*
Copper / chemistry*
Electrochemical Techniques / instrumentation
Electrochemical Techniques / methods*
Stereoisomerism
X-Ray Diffraction / instrumentation
X-Ray Diffraction / methods*

Substances

Aspartic Acid
Copper
Bismuth