Impact of Forward Osmosis Operating Pressure on Deformation, Efficiency and Concentration Polarisation with Novel Links to CFD

Membranes (Basel). 2021 Feb 26;11(3):161. doi: 10.3390/membranes11030161.

Abstract

Forward osmosis (FO) modules currently suffer from performance efficiency limitations due to concentration polarisation (CP), as well as pressure drops during operation. There are incentives to further reduce CP effects, as well as optimise spacer design for pressure drop improvements and mechanical support. In this study, the effects of applying transmembrane pressure (TMP) on FO membrane deformation and the subsequent impact on module performance was investigated by comparing experimental data to 3D computational fluid dynamics (CFD) simulations for three commercial FO modules. At a TMP of 1.5 bar the occlusion of the draw-channel induced by longitudinal pressure hydraulic drop was comparable for the Toray (16%) and HTI modules (12%); however, the hydraulic perimeter of the Profiera module was reduced by 46%. CFD simulation of the occluded channels indicated that a change in hydraulic perimeter due to a 62% increase in shear strain resulted in a 31% increase in the Reynolds number. This reduction in channel dimensions enhanced osmotic efficiency by reducing CP via improved draw-channel hydrodynamics, which significantly disrupted the external concentration polarization (ECP) layer. Furthermore, simulations indicated that the Reynolds number experienced only modest increases with applied TMP and that shear strain at the membrane surface was found to be the most important factor when predicting flux performance enhancement, which varied between the different modules. This work suggests that a numerical approach to assess the effects of draw-spacers on pressure drop and CP can optimize and reduce investment in the design and validation of FO module designs.

Keywords: computational fluid dynamics (CFD); concentration polarisation (CP); draw channel contraction; forward osmosis (FO); pressure assisted osmosis; spacer design.