Use of nanostructured alumina thin films in multilayer anti-reflective coatings

Jarno Reuna; Arto Aho; Riku Isoaho; Marianna Raappana; Timo Aho; Elina Anttola; Arttu Hietalahti; Antti Tukiainen; Mircea Guina

doi:10.1088/1361-6528/abe747

Use of nanostructured alumina thin films in multilayer anti-reflective coatings

Nanotechnology. 2021 Mar 5;32(21). doi: 10.1088/1361-6528/abe747.

Authors

Jarno Reuna¹, Arto Aho¹, Riku Isoaho¹, Marianna Raappana¹, Timo Aho¹, Elina Anttola¹, Arttu Hietalahti¹, Antti Tukiainen¹, Mircea Guina¹

Affiliation

¹ Optoelectronics Research Centre, Physics Unit, Faculty of Engineering and Natural Sciences, Tampere University, PO Box 692, FIN-33014 Tampere, Finland.

PMID: 33596557
DOI: 10.1088/1361-6528/abe747

Abstract

A new method for modification of planar multilayer structures to create nanostructured aluminum oxide anti-reflection coatings is reported. The method is non-toxic and low-cost, being based on treatment of the coating with heated de-ionized water after the deposition of aluminum oxide. The results show that the method provides a viable alternative for attaining a low reflectance ARC. In particular, a low average reflectivity of ∼3.3% is demonstrated in a broadband spectrum extending from 400 nm to 2000 nm for ARCs deposited on GaInP solar-cells, the typical material used as top-junction in solar cell tandem architectures. Moreover, the process is compatible with volume manufacturing technologies used in photovoltaics, such as ion beam sputtering and electron beam evaporation.

Keywords: aluminum oxide; de-ionized water; multilayer; porosity; thin film coatings.