Forming metal contact with low contact resistance is essential for the development of electronics based on layered van der Waals materials. ReS2 is a semiconducting transition metal dichalcogenide (TMD) with an MX2 structure similar to that of MoS2. While most TMDs grow parallel to the substrate when synthesized using chemical vapor deposition (CVD), ReS2 tends to orient itself vertically during growth. Such a feature drastically increases the surface area and exposes chemically active edges, making ReS2 an attractive layered material for energy and sensor applications. However, the contact resistances of vertically grown materials are known to be relatively high, compared to those of common 2H-phase TMDs, such as MoS2. Most reported methods for lowering the contact resistance have been focused on exfoliated 2H-phase materials with only a few devices tested, and few works on distorted T-phase materials exist. Moreover, nearly all reported studies have been conducted on only a few devices with mechanically exfoliated fl Most reported methods for lowering the contact resistance have been 2 contacts was modulated by conformally coating a thin tunneling interlayer between the metal and the dendritic ReS2 film. Over a hundred devices were tested, and contact resistances were extracted for large-scale statistical analysis. Importantly, we compared various known materials and techniques for lowering contact resistance and found an optimized method. Finally, the reductions in barrier height were directly correlated with exponential reductions in contact resistance and increases in drive-current by almost 2 orders of magnitude.
Keywords: ReS2; chemical vapor deposition (CVD); contact resistance; distorted T-phase vdW materials; large-area synthesis; tunneling interlayer.