EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

Ombeline de La Rochefoucauld; Guillaume Dovillaire; Fabrice Harms; Mourad Idir; Lei Huang; Xavier Levecq; Martin Piponnier; Philippe Zeitoun

doi:10.3390/s21030874

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

Sensors (Basel). 2021 Jan 28;21(3):874. doi: 10.3390/s21030874.

Authors

Ombeline de La Rochefoucauld¹, Guillaume Dovillaire¹, Fabrice Harms¹, Mourad Idir², Lei Huang², Xavier Levecq¹, Martin Piponnier¹, Philippe Zeitoun³

Affiliations

¹ Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France.
² Brookhaven National Laboratory, 50 Rutherford Drive, Upton, NY 11973, USA.
³ Laboratoire d'Optique Appliquée, CNRS, ENSTA Paris, Ecole Polytechnique IP Paris, 91120 Palaiseau, France.

Abstract

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

Keywords: EUV wavefront sensor; Hartmann sensor; X-ray sources; X-ray wavefront sensor; metrology; phase imaging.

Abstract

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