At a soft X-ray beamline with an undulator source, significant heat generation at the first-mirror chamber and light emission at the viewport were found, which can be explained by photoelectrons from the mirror. The chamber temperature increases up to approximately 50°C over a period of several hours. A photoelectron shield consisting of thin copper plates not only prevents the heat generation and light emission but also improves the pressure of the vacuum chamber, if a voltage of a few tens of V is applied to the shield. The total electron yield of the shield reached as much as 58 mA under high heat-load conditions, indicating the emission of numerous photoelectrons from the first mirror. Heat-balance analyses suggest that approximately 30% or more of the heat load on the first mirror is transferred to the surroundings.
Keywords: first-mirror chamber; heat load; photoelectron shield; soft X-ray beamline.