Colloidal cubic silicon-carbide nanocrystals have been fabricated, characterized, and introduced into metal-insulator-semiconductor and metal-insulator-metal structures based on hafnium oxide layers. The fabricated structures were characterized through the stress-and-sense measurements in terms of device capacitance, flat-band voltage shift, switching characteristics, and retention time. The examined electrical performance of the sample structures has demonstrated the feasibility of the application of both types of structures based on SiC nanoparticles in memory devices.
Keywords: electrical characterization; high-k dielectric; metal–insulator–metal (MIM); metal–insulator–semiconductor (MIS); silicon-carbide (SiC) nanocrystals.