Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO₂ Thin Films and Their Insulator-Metal Transition Behavior. Materials 2019, 12, 2160

Materials (Basel). 2020 Nov 13;13(22):5132. doi: 10.3390/ma13225132.

Authors

Chunzi Zhang¹, Ozan Gunes¹, Yuanshi Li², Xiaoyu Cui³, Masoud Mohammadtaheri², Shi-Jie Wen⁴, Rick Wong⁴, Qiaoqin Yang², Safa Kasap¹

Affiliations

¹ Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
² Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
³ Canadian Light Source Inc., 44 Innovation Boulevard, Saskatoon, SK S7N 2V3, Canada.
⁴ Cisco Systems Inc., San Jose, CA 95134, USA.

Abstract

The authors would like to correct a typographical error in their paper [...].

Publication types

Published Erratum