Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma

Materials (Basel). 2020 Oct 8;13(19):4466. doi: 10.3390/ma13194466.

Abstract

In this work, the effect of extreme ultraviolet (EUV) radiation and the combination of EUV radiation and low-temperature nitrogen plasma on the physico-chemical properties of polyetheretherketone (PEEK) surfaces were presented. The laser-plasma EUV source based on a double gas puff target was used in this experiment to irradiate PEEK surfaces with nanosecond pulses of EUV radiation and to produce low-temperature plasma through the photoionization of nitrogen with EUV photons. The changes in surface morphology on irradiated polymer samples were examined using atomic force microscopy (AFM) and scanning electron microscopy (SEM). Chemical changes of the PEEK surfaces were analysed using X-ray photoelectron spectroscopy (XPS). EUV radiation and nitrogen plasma treatment caused significant changes in the topography of modified PEEK's surfaces and an increase in their average roughness. Strong chemical decomposition, appearance of new functional groups as well as incorporation of nitrogen atoms up to ~17 at.% on the PEEK's surface were observed.

Keywords: AFM; PEEK; XPS analysis; extreme ultraviolet (EUV); low-temperature plasma; surface chemistry; surface modifications.