Facile production of ultra-fine silicon nanoparticles

Klaudia Tokarska; Qitao Shi; Lukasz Otulakowski; Pawel Wrobel; Huy Quang Ta; Przemyslaw Kurtyka; Aleksandra Kordyka; Mariola Siwy; Margaryta Vasylieva; Aleksander Forys; Barbara Trzebicka; Alicja Bachmatiuk; Mark H Rümmeli

doi:10.1098/rsos.200736

Facile production of ultra-fine silicon nanoparticles

R Soc Open Sci. 2020 Sep 16;7(9):200736. doi: 10.1098/rsos.200736. eCollection 2020 Sep.

Authors

Klaudia Tokarska¹, Qitao Shi², Lukasz Otulakowski¹, Pawel Wrobel¹, Huy Quang Ta³, Przemyslaw Kurtyka⁴, Aleksandra Kordyka¹, Mariola Siwy¹, Margaryta Vasylieva¹, Aleksander Forys¹, Barbara Trzebicka¹, Alicja Bachmatiuk^{1

2

3}, Mark H Rümmeli^{1

2

3

5}

Affiliations

¹ Centre of Polymer and Carbon Materials, Polish Academy of Sciences (CMPW PAN), M. Curie-Sklodowskiej 34, Zabrze 41-819, Poland.
² Soochow Institute for Energy and Materials Innovations (SIEMIS), College of Energy, Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, People's Republic of China.
³ The Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden), Institute for Complex Materials, Helmholtzstrasse 20, 01069 Dresden, Germany.
⁴ Department of Biomaterials and Medical Devices Engineering, Faculty of Biomedical Engineering, Silesian University of Technology, Roosevelta 40, Zabrze 41-800, Poland.
⁵ Institute of Environmental Technology, VSB-Technical University of Ostrava, 17. Listopadu 15, Ostrava 708 33, Czech Republic.

Abstract

A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO_1.5) _n sol-gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl₃), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.

Keywords: Si nanoparticle; synthesis; trichlorosilane; ultra-fine silicon.

Associated data

figshare/10.6084/m9.figshare.c.5112737