In this work, we proposed and experimentally demonstrated a compact and low polarization-dependent silicon waveguide crossing based on subwavelength grating multimode interference couplers. The subwavelength grating structure decreases the effective refractive index difference and shrinks the device footprint. Our designed device is fabricated on the 220-nm SOI platform and performs well. The measured crossing is characterized with low insertion loss (< 1 dB), low polarization-dependence loss (< 0.6 dB), and low crosstalk (< -35 dB) for both TE and TM polarizations with a compact footprint of 12.5 μm × 12.5 μm.