In this study, the influences of bromine-based etching (Br etching) of narrow band gap CuInSe2 (CIS) absorbers and Cu(In,Ga)Se2 absorbers with various single Ga gradings (CIS:Ga) on the properties of solar cells were investigated. Absorbers with narrow absorption edge energies (Eabs) of 1.0-1.02 eV, ideal for the application as a bottom cell in a tandem device, were fabricated using a modified three-stage process and subjected to Br etching. The evolution of surface flatness and their optical and electrical properties upon Br etching were investigated. Br etching typically reduced the root-mean-square deviation of the surface roughness height (Rq) for a CIS:Ga absorber from several hundreds to several tens of nanometers, whereas for some CIS absorbers, Rq reduction was limited by the remaining voids. Moreover, Br etching reduced the leakage current across the pn junction. The high shunt resistances (Rsh) typically up to >10 kΩ·cm2 were obtained by introduction of Br etching. However, etching sometimes adversely increased the VOC deficit. The investigation of the minority carrier lifetime and diode parameters revealed that back-surface recombination in CIS and low-Ga CIS:Ga solar cells increased as the absorber layer thickness decreased. A higher Ga grading significantly reduced back-surface recombination. Narrow band gap CIGS solar cells with improved surface flatness and high VOC were achieved by introducing Br etching and proper Ga grading.
Keywords: CIGS; chalcopyrite; chemical etching; photovoltaic; surface morphology; tandem solar cell; thin-film solar cell.