Performance Degradation in Graphene-ZnO Barristors Due to Graphene Edge Contact

ACS Appl Mater Interfaces. 2020 Jun 24;12(25):28768-28774. doi: 10.1021/acsami.0c04325. Epub 2020 Jun 16.

Abstract

The physical and chemical characteristics of the edge states of graphene have been studied extensively as they affect the electrical properties of graphene significantly. Likewise, the edge states of graphene in contact with semiconductors or transition-metal dichalcogenides (TMDs) are expected to have a strong influence on the electrical properties of the resulting Schottky junction devices. We found that the edge states of graphene form chemical bonds with the ZnO layer, which limits the modulation of the Fermi level at the graphene-semiconductor junction, in a manner similar to Fermi level pinning in silicon devices. Therefore, we propose that graphene-based Schottky contact should be accomplished with minimal edge contact to reduce the limits imposed on the Fermi level modulation; this hypothesis has been experimentally verified, and its microscopic mechanism is further theoretically examined.

Keywords: Fermi level pinning; edge contact; graphene barristor; graphene−semiconductor heterojunctions; transistors.