This review summarizes the use of photoreactions that replace conventional heating processes for growing oxide thin films from chemical solutions. In particular, this review outlines key variables in photoreactions that affect epitaxial and polycrystalline thin film growth, including precursor materials, laser wavelength, laser fluence, and carbon. In addition, the features of the photoreaction process that can be controlled at a low temperature by oxygen non-stoichiometry are examined. Likewise, functions that are neither achieved by developing a gradient structure nor controlled by a thermal equilibrium reaction are detailed. Two new concepts are presented, known as photoreaction of nanoparticles (PRNP) and photoreaction of a hybrid solutions (PRHS), in which crystal nuclei are pre-dispersed in a metal-organic compound film. This method has successfully produced flexible phosphor films used as resistor or thermistor electronic components. Finally, thin film growth using different light sources such as flash lamps and femtosecond lasers (fs) is explored.
Keywords: UV laser; crystal growth; epitaxy; flexible; metal oxide; thin films.
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